MKS T3BIB-29916 | T3B Series High-Speed Exhaust Valve with Integrated Controller

MKS T3BIB-29916 | T3B Series High-Speed Exhaust Valve with Integrated Controller

  • Model: T3BIB-29916
  • Brand: MKS Instruments
  • Series: T3B High-Speed Exhaust Throttle Valve
  • Core Function: Provides precise vacuum pressure regulation by controlling exhaust gas flow through an integrated throttle valve and control electronics.
  • Product Type: Intelligent Exhaust Throttle Valve / Vacuum Control Valve
  • Key Specs:
    • High-speed direct-drive throttle control
    • Integrated valve driver and control electronics
    • Accuracy: ±0.25% of set point or 5 mV
    • Control range: 0.0001%–100% full scale
    • 24 VDC valve power supply
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Category: SKU: MKS T3BIB-29916

Description

Key Technical Specifications

Parameter Value
Product Model T3BIB-29916
Manufacturer MKS Instruments
Product Type High-Speed Exhaust Throttle Valve
Series T3B Intelligent Exhaust Throttle Valve
Application Vacuum pressure control systems
Valve Structure Butterfly throttle valve with integrated electronics
Valve Bore / Flange Configuration code dependent
Control Accuracy ±0.25% of set point or 5 mV (whichever is greater)
Control Range 0.0001%–100% full scale
Response Time Less than 10 ms
Repeatability Less than 0.1%
Maximum Pressure Rating Configuration dependent
Valve Power Supply 24 VDC
Electronics Supply DeviceNet models: 11–25 VDC
Communication Options DeviceNet, RS-232, Analog/TTL
Pressure Sensor Input Dual transducer input supported
Operating Temperature Electronics: 0–40°C; Valve body: 0–105°C
High Temperature Option Up to 150°C with compatible seals
Seal Options Viton, Chemraz, Kalrez options
Typical Applications Semiconductor vacuum processing, thin film equipment, process chambers

 

Product Introduction

 

MKS T3BIB-29916 Product Introduction

MKS T3BIB-29916 is an intelligent high-speed exhaust throttle valve designed for vacuum process pressure control applications. It combines the throttle valve mechanism, drive electronics, and control functions into one assembly, reducing the need for a separate valve controller module.

The main value of MKS T3BIB-29916 is precise and repeatable pressure regulation in semiconductor and vacuum process equipment. Its fast response and integrated control architecture make it suitable for applications where chamber pressure stability directly affects process results. Confirm flange size, communication interface, firmware revision, and seal material before replacement.

T3BIB-29916

Application Scenarios & Field Pitfalls (The Engineer’s Perspective)

 

Engineering Pain Point

A semiconductor process chamber starts showing unstable pressure control during recipe execution. The vacuum pump is operating normally, but pressure oscillation appears during throttle adjustments. The problem often points toward the exhaust throttle valve response, calibration data, communication settings, or mechanical wear.

The T3BIB sits directly in the pressure control loop. Small configuration differences can affect process stability.

 

Typical Applications

  • Semiconductor Manufacturing – Etch, deposition, and plasma process chamber pressure regulation.
  • Vacuum Coating Systems – Exhaust control for thin film deposition equipment.
  • Research Vacuum Equipment – Laboratory systems requiring automated pressure control.
  • Industrial Process Systems – Gas flow and vacuum regulation applications requiring fast valve response.

 

Technical Pitfalls to Avoid

  1. Verify the Complete Model Configuration
    The T3BIB series uses coded options for bore size, flange type, valve style, communication method, pressure sensor power, and firmware. Confirm the complete ordering configuration before replacement.
  2. Check Communication Parameters
    DeviceNet, RS-232, and Analog/TTL versions are not interchangeable without configuration changes. Confirm the host controller interface before installation.
  3. Inspect Vacuum System Conditions
    Valve performance can be affected by chamber contamination, deposits, mechanical sticking, or incorrect pressure sensor calibration. A valve replacement may not solve a process instability caused by upstream vacuum issues.

 

Related Products

  • MKS T3BIA Series
    Earlier T3B intelligent throttle valve configuration. Similar control architecture with different ordering options and application configurations.
  • MKS T3B High-Speed Exhaust Throttle Valve
    The base valve family supporting semiconductor and vacuum process pressure control applications.
  • MKS 651C Series Pressure Controller
    External pressure controller platform commonly used in vacuum process systems requiring separate valve control.
  • MKS 600 Series Pressure Controllers
    Pressure control products used with vacuum chambers and gas delivery systems.
  • MKS Baratron® Pressure Transducers
    Capacitance manometer sensors used for accurate vacuum pressure measurement and closed-loop control.
  • MKS Type 153 Controller
    Process control unit used in some MKS vacuum and gas handling architectures.
  • MKS Type 146 Mass Flow Controller Electronics
    Related process control hardware used in semiconductor gas management systems.
  • MKS Vacuum Control Systems
    Integrated pressure management platforms combining valves, sensors, and controllers for automated vacuum processes.